HfCdO is a ternary oxide ceramic compound combining hafnium, cadmium, and oxygen, representing an experimental material in the hafnium oxide family. While not widely established in mainstream engineering, this compound is of research interest for high-temperature dielectric and optical applications, particularly where hafnium oxide's thermal stability and cadmium's optical properties might be leveraged. Engineers would consider this material primarily in advanced research contexts rather than conventional production, such as for specialized thin-film coatings or next-generation semiconductor device structures.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 9.001 | kg/m³ | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.000 | µB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 2.093 | eV/atom | — | ||
Formation Energy(ΔHf) | 0.1564 | eV/atom | — |