HfAlOFN

ceramic

· HfAlOFN

HfAlOFN is an advanced ceramic compound combining hafnium, aluminum, oxygen, and fluorine/nitrogen phases, designed for extreme-environment applications requiring thermal stability and chemical resistance. This material family is primarily investigated in aerospace and semiconductor industries for high-temperature barriers, gate dielectrics, and protective coatings where conventional oxides or nitrides reach performance limits. Its appeal lies in combining the thermal stability of hafnium-based ceramics with the chemical inertness and oxidation resistance of fluoride and nitride phases, making it a candidate for next-generation integrated circuits and thermal protection systems.

high-temperature ceramic coatingssemiconductor gate dielectricsaerospace thermal barrierschemical/corrosion resistanceintegrated circuit manufacturingresearch/advanced materials

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)	2.437e-12	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	1.020	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

HfAlOFN

Electrical Properties

Other Properties

Regulatory Screening

Environmental