HfAlN3 is a ternary ceramic nitride compound combining hafnium, aluminum, and nitrogen, belonging to the family of refractory ceramic materials. This material is primarily of research and development interest for ultra-high-temperature applications where exceptional hardness, thermal stability, and oxidation resistance are critical; it is investigated for next-generation coating systems and structural components in extreme environments, offering potential advantages over binary nitrides (such as TiN or AlN) through improved creep resistance and thermal shock tolerance at elevated temperatures.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.7869 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.160 | eV/atom | — |