Hf8 N8 O4

semiconductor

· Hf8 N8 O4

Hf8N8O4 is a hafnium oxynitride ceramic compound combining hafnium, nitrogen, and oxygen in a mixed anionic structure. This material belongs to the family of refractory oxynitrides—advanced ceramics engineered for extreme-temperature and high-energy applications where conventional oxides or nitrides alone are insufficient. While primarily a research-phase compound, hafnium oxynitrides are investigated for next-generation thermal barrier coatings, high-temperature structural applications, and electronic devices where chemical stability, thermal conductivity, and oxidation resistance under severe conditions are critical.

thermal barrier coatingshigh-temperature structural ceramicsaerospace engine componentsrefractory applicationssemiconductor device research

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	1.126	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-2.401	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

Hf8 N8 O4

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control