Hf6 N4 O6

semiconductor

· Hf6 N4 O6

Hf₆N₄O₆ is an oxynitride ceramic compound containing hafnium, nitrogen, and oxygen—a material class that combines the high-temperature stability of hafnium oxides with the hardness and refractory properties of nitrides. This mixed-anion ceramic is primarily investigated in research contexts for ultra-high-temperature structural applications and as a candidate material for next-generation thermal barrier coatings and refractory components where conventional oxides alone fall short in extreme environments.

thermal barrier coatingsrefractory liningshigh-temperature structural ceramicsaerospace heat protectionnuclear reactor componentsresearch/experimental applications

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	3.356	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-2.917	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

Hf6 N4 O6

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control