Hf4 Al3

semiconductor

· Hf4 Al3

Hf4Al3 is an intermetallic compound combining hafnium and aluminum, belonging to the refractory metal-aluminum family of materials. This compound is primarily of research and development interest for high-temperature structural applications, where its hafnium content offers potential for oxidation resistance and thermal stability beyond conventional aluminum alloys. Engineering interest centers on aerospace and advanced energy systems where extreme temperature environments demand materials that maintain integrity at elevated temperatures, though industrial deployment remains limited compared to established superalloys and conventional aluminum-lithium alloys.

high-temperature aerospace componentsrefractory intermetallics researchoxidation-resistant coatingsadvanced energy systemsthermal barrier applicationsexperimental structural materials

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.00400	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-0.3840	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

Hf4 Al3

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control