Hf2 Ta1 N3

semiconductor
· Hf2 Ta1 N3

Hf₂Ta₁N₃ is a refractory ceramic compound belonging to the transition metal nitride family, combining hafnium and tantalum nitrides in a high-entropy ceramic matrix. This material is primarily investigated in research contexts for ultra-high-temperature applications where exceptional thermal stability and hardness are critical, offering potential advantages over traditional refractory carbides and nitrides in extreme aerospace and energy environments. Its mixed-metal composition is designed to leverage the complementary properties of hafnium and tantalum—both among the highest-melting-point transition metals—making it a candidate for next-generation thermal barrier coatings, hypersonic vehicle components, and advanced nuclear fuel cladding where conventional materials reach their limits.

hypersonic vehicle structuresthermal barrier coatingsrefractory rocket nozzlesextreme-temperature research applicationsadvanced nuclear materialshigh-entropy ceramics development

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65
Units:
siimperial
PropertyValueUnitConditionsSource
Band Gap(Eg)
—
eV——
Verified Unverified Low confidence (<80%) Link to source
PropertyValueUnitConditionsSource
Formation Energy(ΔHf)
—
eV/atom——
Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.