Hf1 Ta1 N1 O3
semiconductor· Hf1 Ta1 N1 O3
HfTaNO is an experimental transition metal oxynitride compound combining hafnium, tantalum, nitrogen, and oxygen in a 1:1:1:3 stoichiometry. This material belongs to the emerging class of high-entropy and multi-principal element ceramics, which are under investigation for their potential to achieve exceptional hardness, thermal stability, and chemical resistance beyond traditional binary or ternary ceramics. The specific phase and crystal structure of this composition remain largely in the research domain, making it a candidate material for next-generation applications requiring extreme performance in harsh environments where conventional oxides or nitrides fall short.
High-temperature structural coatingsWear-resistant cutting toolsAerospace thermal barrier systemsMaterials research and developmentSemiconductor device applicationsChemical corrosion resistance coatings
Compliance & Regulations
?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | — | ksi | — | — | |
Shear Modulus(G) | — | ksi | — | — |
Verified Unverified Low confidence (<80%) Link to source
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | — | eV | — | — |
Verified Unverified Low confidence (<80%) Link to source
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | — | eV/atom | — | — |
Verified Unverified Low confidence (<80%) Link to source
Regulatory Screening
Environmental
Export Control
RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.