Hf1 Si1 Ni1

semiconductor

· Hf1 Si1 Ni1

HfSiNi is an intermetallic compound combining hafnium, silicon, and nickel in equiatomic proportions, representing a ternary system that bridges refractory and functional material families. This is primarily a research-stage material studied for its potential in high-temperature structural applications and as a semiconductor material; its notable stiffness and thermal stability make it a candidate for exploring new intermetallic phases, though industrial adoption remains limited compared to established binary systems like Ni-Si or Hf-based alloys.

high-temperature structural intermetallicssemiconductor research compoundsrefractory material developmentthermal barrier coating systemsadvanced alloy phase explorationextreme environment applications

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Bulk Modulus(K)	126.6	GPa	—
Shear Modulus(G)	15.48	GPa	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.02590	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-0.2730	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

Hf1 Si1 Ni1

Mechanical Properties

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control