Hf1 O2

ceramic

· Hf1 O2

Hafnium dioxide (HfO₂) is a high-performance ceramic oxide belonging to the refractory oxide family, valued for its exceptionally high melting point and thermal stability. It is widely used in advanced microelectronics as a high-κ dielectric material in next-generation semiconductor gate oxides, replacing traditional SiO₂ to enable continued transistor scaling, and also appears in thermal barrier coatings for aerospace engines, optical applications, and as a nuclear fuel additive. Engineers select HfO₂ over conventional alternatives when extreme thermal resistance, robust dielectric performance at reduced thicknesses, or superior radiation tolerance is required.

semiconductor gate dielectricsthermal barrier coatingshigh-temperature refractoriesoptical coatingsnuclear fuel claddingaerospace engine components

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Bulk Modulus(K)	37,961.2	ksi	—
Shear Modulus(G)	19,965.9	ksi	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	4.037	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-3.734	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

Hf1 O2

Mechanical Properties

Electrical Properties

Other Properties

Regulatory Screening

Environmental