Hf1 Ga1 Ir2

semiconductor

· Hf1 Ga1 Ir2

HfGaIr₂ is an intermetallic compound combining hafnium, gallium, and iridium in a 1:1:2 stoichiometric ratio. This is a research-phase material belonging to the high-entropy or complex intermetallic family, with potential applications in extreme-temperature and high-performance structural contexts where conventional superalloys reach their limits. The material's appeal lies in its density and melting point characteristics typical of refractory intermetallics, making it relevant for aerospace propulsion and thermal barrier applications where weight and thermal stability are critical trade-offs.

high-temperature structural applicationsaerospace propulsion systemsrefractory intermetallics researchthermal barrier coatings (development stage)advanced materials screeningextreme environment engineering

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.01550	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-0.7230	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

Hf1 Ga1 Ir2

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control