HfCdO₃ is an experimental ternary oxide semiconductor compound combining hafnium and cadmium oxides, belonging to the broader class of wide-bandgap and perovskite-related semiconductor materials. This compound is primarily of research interest for next-generation optoelectronic and high-temperature electronic applications, where the combination of hafnium's thermal stability and cadmium oxide's semiconductor properties may enable novel device architectures. Interest in this material family stems from potential advantages in UV detection, transparent electronics, and extreme-environment sensing where conventional semiconductors (Si, GaAs) are limited.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.05040 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -2.453 | eV/atom | — |