Hf1 Al1 Ir2

semiconductor

· Hf1 Al1 Ir2

Hf1Al1Ir2 is an intermetallic compound combining hafnium, aluminum, and iridium in a 1:1:2 ratio, classified as a semiconductor with potential high-temperature and refractory applications. This is an experimental/research-phase material belonging to the family of ternary intermetallics, which are of interest for extreme-environment aerospace and catalytic applications where conventional alloys reach their thermal or chemical limits. The combination of hafnium's refractory properties, iridium's nobility and hardness, and aluminum's lightweight character suggests potential utility in specialized high-temperature coatings, catalytic surfaces, or electronic applications, though industrial deployment remains limited pending further development and characterization.

high-temperature coatingsaerospace researchrefractory intermetallicscatalytic surfacessemiconductor researchextreme environment applications

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Bulk Modulus(K)	31,773	ksi	—
Shear Modulus(G)	-1,177.7	ksi	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.01070	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-0.9500	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

Hf1 Al1 Ir2

Mechanical Properties

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control