H8 N4 O6
semiconductorH8N4O6 is an experimental semiconductor compound belonging to the nitrogen-oxygen-hydrogen family, likely investigated for its potential in wide-bandgap or heterostructure applications. While not yet established in mainstream industrial production, materials in this chemical system are of research interest for high-temperature electronics, optoelectronic devices, and specialized semiconductor applications where conventional silicon or III-V compounds face limitations. Its mechanical properties and semiconducting behavior suggest potential relevance to harsh-environment sensing or power electronics, though engineering adoption would require further development and characterization of reliability and manufacturability.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 27.19 | GPa | — | ||
Shear Modulus(G) | 5.173 | GPa | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 3.139 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.4760 | eV/atom | — |