H6 Al2 is a semiconductor material based on aluminum oxide (alumina, Al2O3), likely referring to a specific crystalline phase or doped variant used in advanced electronic applications. This material combines the thermal stability and electrical insulating properties of alumina with semiconductor functionality, making it relevant for high-temperature device architectures where traditional silicon or gallium arsenide would be unsuitable. Al2O3-based semiconductors are explored in research contexts for power electronics, photonics, and integrated circuits operating in extreme environments where thermal management and chemical resistance are critical.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 5,348.7 | ksi | — | ||
Shear Modulus(G) | 7,046.9 | ksi | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 2.464 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.1030 | eV/atom | — |