H4 O4 F4 Cu4

semiconductor

· H4 O4 F4 Cu4

This is a copper fluoride hydroxide compound (Cu₄O₄F₄H₄), a halide-based semiconductor material that combines copper, oxygen, fluorine, and hydrogen in a crystalline structure. Research compounds of this chemical family are investigated for potential optoelectronic and photocatalytic applications, leveraging copper's semiconducting properties and fluorine's strong electronegativity to engineer band gaps and electronic structure. Such materials remain largely exploratory rather than established in high-volume industrial production, with primary interest in academic and advanced materials development communities.

photocatalytic researchoptoelectronic devicescopper-based semiconductorsfluoride materials researchemerging functional ceramicsband-gap engineering

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Bulk Modulus(K)	78.48	GPa	—
Shear Modulus(G)	25.67	GPa	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.00380	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-1.184	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

H4 O4 F4 Cu4

Mechanical Properties

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control