GeSiO₂S is an experimental quaternary semiconductor compound combining germanium, silicon, oxygen, and sulfur—a chalcogenide glass or mixed-anion semiconductor material still primarily in research development rather than established industrial production. This material family is investigated for infrared optics, nonlinear optical applications, and potential photonic devices where the combination of glass-forming properties with semiconducting behavior offers advantages over single-component systems. Its mixed composition allows tuning of bandgap and refractive index properties, making it notable for applications requiring transparency in mid-to-far infrared wavelengths where conventional glasses fail.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.300 | eV | — | ||
Magnetic Moment(μB) | 0.000164 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.9400 | eV/atom | — |