GeNbO₂N is an experimental oxynitride semiconductor compound combining germanium, niobium, oxygen, and nitrogen elements. This material belongs to the emerging class of mixed-anion semiconductors, which are under research for optoelectronic and photocatalytic applications where conventional single-anion semiconductors show limitations. GeNbO₂N and related oxynitride systems are being investigated primarily in academic and industrial research settings for their potential to enable visible-light photocatalysis, photoelectrochemical water splitting, and next-generation semiconductor device architectures.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.100 | eV | — | ||
Magnetic Moment(μB) | -2.989e-7 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.2800 | eV/atom | — |