GeNbO₂N is an experimental oxynitride semiconductor compound combining germanium, niobium, oxygen, and nitrogen elements. This material belongs to the emerging class of mixed-anion semiconductors, which are under research for optoelectronic and photocatalytic applications where conventional single-anion semiconductors show limitations. GeNbO₂N and related oxynitride systems are being investigated primarily in academic and industrial research settings for their potential to enable visible-light photocatalysis, photoelectrochemical water splitting, and next-generation semiconductor device architectures.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.100 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -2.989e-7 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.2800 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data