GeInO₂N is an experimental ternary ceramic compound combining germanium, indium, oxygen, and nitrogen. This material belongs to the family of wide-bandgap semiconductors and oxynitride ceramics, currently under research investigation for advanced optoelectronic and high-temperature applications. While not yet in widespread industrial production, GeInO₂N and related oxynitride systems are being explored for next-generation semiconductors and refractory coatings where conventional nitrides or oxides reach performance limits.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | -0.7976 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.100 | eV/atom | — |