GaSiOFN

ceramic

· GaSiOFN

GaSiOFN is an oxynitride ceramic compound combining gallium, silicon, oxygen, and nitrogen phases, representing a research-stage material in the family of advanced nitride and oxynitride ceramics. This material is being investigated for high-temperature structural applications and potentially for optical or electronic device contexts where the mixed anionic composition (oxide-nitride) can tailor mechanical and thermal properties. Compared to conventional nitride ceramics, oxynitride systems like GaSiOFN offer the ability to engineer phase stability and sinterability, making them candidates for applications where traditional silicon nitride or gallium nitride alone may have processing or performance limitations.

high-temperature structural ceramicsadvanced ceramic compositesresearch and developmentrefractory applicationssemiconductor device substratesthermal management systems

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)	-7.044e-18	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	0.9000	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

GaSiOFN

Electrical Properties

Other Properties

Regulatory Screening

Environmental