GaNbON2 is an experimental oxynitride semiconductor compound combining gallium, niobium, oxygen, and nitrogen—a member of the emerging mixed-anion semiconductor family that aims to extend bandgap engineering beyond conventional binary nitrides and oxides. This material is primarily of research interest for next-generation optoelectronic and wide-bandgap device applications, where its unique electronic structure could enable improved performance in UV photonics, high-voltage power electronics, or photocatalytic applications compared to established GaN or Ga2O3 platforms; however, synthesis routes and scalability remain under development.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.5000 | eV | — | ||
Magnetic Moment(μB) | -0.000158 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.5400 | eV/atom | — |