GaAsO₂N is an experimental III-V oxynitride ceramic compound combining gallium, arsenic, oxygen, and nitrogen. This material belongs to the family of wide-bandgap semiconductors and ceramic nitrides, developed primarily in research settings to explore novel electronic and photonic properties that may bridge the performance gap between traditional GaAs semiconductors and nitride-based materials. The oxynitride composition is of interest for potential applications in high-temperature electronics, photocatalysis, and next-generation optoelectronic devices where conventional arsenide or nitride materials alone have limitations.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.00118 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.200 | eV/atom | — |