GaAlN3 is a gallium aluminum nitride compound, part of the III-nitride semiconductor family that forms the foundation for high-performance optoelectronic and power electronic devices. This material is primarily of research and development interest, with potential applications in wide-bandgap semiconductor technology where superior thermal stability, high electron mobility, and radiation hardness are critical advantages over traditional silicon-based alternatives.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 2.030 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.780 | eV/atom | — |