Ga₁₁N₁O₁₅ is an experimental gallium nitride-based oxide compound that belongs to the family of wide-bandgap semiconductors. This material is primarily of research interest for advanced optoelectronic and high-temperature semiconductor applications, as gallium nitride systems are known for high breakdown fields and thermal stability. The oxide phase composition suggests potential use in developing transparent conductive oxides, high-k dielectrics, or novel heterostructure interfaces, though this specific stoichiometry remains in early-stage investigation rather than established industrial production.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.800 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.856 | eV/atom | — |