CuHfO2F
semiconductorCuHfO2F is an experimental mixed-metal oxide fluoride compound combining copper, hafnium, oxygen, and fluorine—a composition that places it in the emerging family of complex oxyfluoride semiconductors. This material is primarily a research compound under investigation for advanced electronic and photonic applications, where the combination of hafnium's high dielectric strength and copper's electronic properties offers potential advantages in next-generation devices. The fluoride incorporation is notable for modifying bandgap, ionic conductivity, and defect chemistry compared to conventional oxides, making it of interest for optoelectronic and solid-state ionic applications, though commercial deployment remains limited.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | — | eV | — | — | |
Magnetic Moment(μB) | — | μB | — | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | — | eV/atom | — | — |