Cobalt disilicide (CoSi₂) is an intermetallic compound combining cobalt and silicon, belonging to the family of transition metal silicides. It is primarily used in semiconductor and microelectronic applications as a contact material and silicide layer, where its low electrical resistivity and compatibility with silicon processing make it valuable for reducing contact resistance in integrated circuits. CoSi₂ is also explored in high-temperature structural applications and thermoelectric devices due to its thermal stability and metallic bonding characteristics, offering advantages over pure metals in scenarios requiring both electrical conductivity and resistance to oxidation.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K)3 entries | 176.9 | GPa | — | ||
| ↳ | 176.9 | GPa | — | ||
| ↳ | 171.4 | GPa | — | ||
Elastic Compliance Tensor(Sij) | Matrix (redacted) | 1/GPa | — | ||
Elastic Anisotropy(AU) | 0.5861 | - | — | ||
Elastic Stiffness Tensor(Cij) | Matrix (redacted) | Pa | — | ||
Poisson's Ratio(ν)2 entries | 0.3378 | - | — | ||
| ↳ | 0.3300 | - | — | ||
Shear Modulus(G)3 entries | 64.36 | GPa | — | ||
| ↳ | 64.36 | GPa | — | ||
| ↳ | 67.24 | GPa | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 4.892 | kg/m³ | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.000 | µB | — | ||
Seebeck Coefficient(S) | 4.220 | µV/K | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.000 | eV/atom | — | ||
Formation Energy(ΔHf)2 entries | -0.3617 | eV/atom | — | ||
| ↳ | -0.3690 | eV/atom | — |