Cl₆Ga₂ (gallium chloride) is an inorganic compound and precursor material in the gallium semiconductor family, used primarily in vapor-phase deposition processes for manufacturing compound semiconductors. This material is notable in optoelectronic and high-frequency device fabrication, where it serves as a chloride source for metal-organic chemical vapor deposition (MOCVD) and related thin-film growth techniques. Engineers select it for applications requiring high-purity gallium integration, particularly where chlorine-based growth chemistries offer advantages in crystal quality or doping control compared to alternative precursors.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 3.920 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.075 | eV/atom | — |