Ca4 Hf2 O8
semiconductorCa₄Hf₂O₈ is a ceramic oxide compound combining calcium and hafnium in a mixed-valence structure, belonging to the family of complex oxides with potential semiconductor properties. This material is primarily investigated in research contexts for high-temperature applications and advanced electronic devices, where hafnium-based ceramics are valued for their thermal stability, chemical inertness, and potential for tuning electronic properties through compositional design. While not yet widely commercialized, compounds in this family are of interest as alternatives to conventional oxides in extreme-environment electronics and as gate dielectrics or thermal barrier coating components where hafnium's high melting point and mechanical rigidity provide advantages over traditional materials.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | — | ksi | — | — | |
Shear Modulus(G) | — | ksi | — | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | — | eV | — | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | — | eV/atom | — | — |