AsSiO₂N is an experimental oxynitride semiconductor compound combining arsenic, silicon, oxygen, and nitrogen phases, representing an emerging class of wide-bandgap materials under research for advanced optoelectronic and high-temperature applications. While not yet commercialized at production scale, this material family is investigated for potential use in ultraviolet emitters, high-power electronics, and extreme-environment sensors where conventional semiconductors (GaAs, GaN) face thermal or wavelength limitations. Engineers would consider this material primarily in R&D contexts where access to novel bandgap engineering and thermal stability characteristics could enable next-generation device architectures.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.8000 | eV | — | ||
Magnetic Moment(μB) | 3.922e-7 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.8000 | eV/atom | — |