AsGaO₂S is a mixed-anion semiconductor ceramic combining arsenic, gallium, oxygen, and sulfur—a compound primarily explored in research rather than established industrial production. This material belongs to the family of III-V semiconductors with oxygen and sulfur co-incorporation, investigated for potential optoelectronic and photovoltaic applications where band gap engineering through mixed-anion doping offers advantages over traditional binary compounds. While not yet widely adopted in commercial engineering, AsGaO₂S represents an emerging direction in tunable semiconductor materials for devices requiring tailored optical absorption or charge transport properties.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 0.000273 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.9200 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data