AsGaO2F is an experimental semiconductor compound combining arsenic, gallium, oxygen, and fluorine elements. This material belongs to the family of mixed-anion semiconductors and remains primarily in research phase, with potential applications in optoelectronics and wide-bandgap device development where fluorine incorporation may enable tunable electronic properties or enhanced stability compared to conventional III-V semiconductors.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.100 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 1.057e-15 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.8600 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data