AsAlN3 is an experimental III-V nitride compound combining arsenic, aluminum, and nitrogen, belonging to the wide-bandgap semiconductor family. This material remains largely in the research phase, with potential applications in high-temperature and high-power electronic devices where conventional nitrides (GaN, AlN) reach performance limits. Its development is driven by interest in extending semiconductor performance into more extreme operating conditions, though industrial adoption and processing techniques are not yet established.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 2.149 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.840 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data