Al1 Ni2 Hf1

semiconductor

· Al1 Ni2 Hf1

Al1Ni2Hf1 is an intermetallic compound combining aluminum, nickel, and hafnium, classified as a semiconductor material. This ternary system represents an experimental or research-phase composition, as such multi-component intermetallics are typically investigated for advanced high-temperature structural applications and electronic properties rather than mainstream industrial production. The hafnium addition is notable for its potential to enhance thermal stability and oxidation resistance compared to binary Al-Ni systems, making this material family of interest in aerospace and materials research contexts where extreme environments demand materials with stable semiconductor or intermediate electrical properties.

high-temperature structural researchaerospace advanced materialsintermetallic compound developmentthermal barrier studiesoxidation-resistant coatingssemiconductor research applications

Compliance & Regulations

?EAR?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Bulk Modulus(K)	161.1	GPa	—
Shear Modulus(G)	31.06	GPa	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.04420	eV	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	-0.6570	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

Export Control

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

Al1 Ni2 Hf1

Mechanical Properties

Electrical Properties

Other Properties

Regulatory Screening

Environmental

Export Control