ZrGaO₂N is an oxynitride semiconductor compound combining zirconium, gallium, oxygen, and nitrogen—a research-stage material that extends the semiconductor design space beyond conventional binary oxides and nitrides. This material family is investigated primarily for wide-bandgap photocatalysis and photovoltaic applications, where the mixed anionic framework (oxygen and nitrogen) enables bandgap engineering and visible-light response. ZrGaO₂N and related oxynitrides offer potential advantages over single-anion semiconductors in catalytic water splitting and pollutant degradation, though they remain largely in academic development and are not yet deployed in mainstream commercial products.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.900 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | -0.000894 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.7600 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data