TiNCl4 is a titanium-based chloride compound that exists primarily as a precursor chemical and intermediate in titanium processing rather than as a structural or functional engineering material in its own right. It is encountered in metallurgical and chemical vapor deposition (CVD) processes where it serves as a source material for depositing titanium nitride coatings or manufacturing high-purity titanium products. Engineers would select processes involving TiNCl4 when requiring controlled synthesis of titanium nitride films for wear resistance or when pursuing ultra-high purity titanium extraction, though it is not typically specified as an end-use material for load-bearing or directly functional applications.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Density(ρ) | 2.495 | kg/m³ | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 2.655 | µB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Energy Above Hull(ΔEhull) | 0.8396 | eV/atom | — | ||
Formation Energy(ΔHf) | -0.4960 | eV/atom | — |