TaHfON2 is a refractory ceramic compound combining tantalum, hafnium, oxygen, and nitrogen—a quaternary ceramic in the oxynitride family designed for extreme high-temperature applications. This material represents research into ultra-high-temperature ceramics (UHTCs) that can withstand severe thermal and oxidative environments beyond conventional oxide or nitride ceramics alone. It is notable for targeting aerospace and propulsion systems where materials must resist temperatures exceeding 1800°C while maintaining structural integrity under oxidative stress; the tantalum–hafnium combination leverages the high refractory character of both elements, while the oxynitride chemistry aims to improve toughness and oxidation resistance compared to pure oxides or nitrides.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 0.1738 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.6400 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data