Ta₂N₄ is a tantalum nitride ceramic compound in the refractory nitride family, representing a higher-nitrogen stoichiometry relative to common tantalum nitride phases. This material is primarily of research interest for high-temperature structural and electronic applications, where its hardness and thermal stability are potentially advantageous. Industrial adoption remains limited compared to established nitrides (TiN, WN), but the material shows promise in hard coatings, semiconductor processing equipment, and advanced refractory applications where tantalum's high melting point and chemical inertness are needed.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.02590 range 0.00400–0.04780median of 2 measurements | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.3385 range -0.5950–-0.08200median of 2 measurements | eV/atom | — |