Ta1N2 is a ceramic nitride compound in the refractory metal nitride family, combining tantalum and nitrogen in a 1:2 stoichiometric ratio. This material is primarily investigated in research and advanced applications for its potential as a hard, wear-resistant coating and high-temperature structural phase, particularly where extreme hardness and thermal stability are required. Compared to binary tantalum nitride (TaN), the higher nitrogen content in Ta1N2 may offer enhanced hardness and oxidation resistance, making it of interest in cutting tool coatings, protective barriers, and semiconductor device applications, though industrial adoption remains limited relative to more established refractory nitrides.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.01210 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.5840 | eV/atom | — |