Ta1Cu1Rh2 is a ternary intermetallic compound combining tantalum, copper, and rhodium in a 1:1:2 ratio. This is primarily a research-phase material investigated for its potential in high-temperature and corrosion-resistant applications, leveraging the refractory properties of tantalum and the catalytic/noble-metal characteristics of rhodium. While not yet mature for widespread industrial deployment, materials in this compositional family are of interest where extreme thermal stability, oxidation resistance, and electrical properties are simultaneously required.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.00420 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.4460 | eV/atom | — |