SiHfON₂ is an advanced ceramic compound combining silicon, hafnium, oxygen, and nitrogen—belonging to the oxynitride ceramic family. This material is primarily of research interest for ultra-high-temperature applications and protective coatings, where the hafnium and silicon components provide oxidation resistance and structural stability, while the oxynitride matrix offers enhanced toughness compared to purely oxide ceramics. The combination is notable for potential aerospace and thermal barrier applications where traditional ceramics may degrade.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 0.2856 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.280 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data