SiHfO₂N is an advanced ceramic compound combining silicon, hafnium, oxygen, and nitrogen phases, representing a quaternary oxide-nitride system designed for extreme thermal and chemical environments. This material family is primarily investigated for high-temperature structural applications where superior oxidation resistance, thermal stability, and mechanical retention at elevated temperatures are critical. It competes with traditional alumina, yttria-stabilized zirconia (YSZ), and other refractory ceramics by leveraging hafnium's high atomic mass and strong bonding characteristics to resist degradation in oxidizing atmospheres and thermal cycling.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | DFT · GLLB-SC | ||
Magnetic Moment(μB) | 0.9934 | μB | DFT |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.520 | eV/atom | DFT |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data