Si₃As₁ is an experimental III-V semiconductor compound combining silicon and arsenic in a 3:1 stoichiometric ratio. This material belongs to the broader family of silicon-arsenic phases, which are of interest in semiconductor research for potential applications in optoelectronics and high-speed devices, though it remains primarily a research compound rather than an established commercial material. Si₃As₁ represents an unconventional composition within the Si-As phase diagram and is typically explored for novel bandgap engineering, thin-film deposition studies, and heterojunction device concepts rather than mainstream industrial use.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.00440 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 0.6820 | eV/atom | — |