Rb8N1O3 is an experimental mixed-metal oxide semiconductor compound containing rubidium, nitrogen, and oxygen. While this specific stoichiometry is not widely established in commercial applications, it belongs to the family of nitrogen-doped metal oxides being investigated for advanced electronic and photocatalytic properties. Research compounds of this type are of interest in materials science for potential applications in energy conversion, catalysis, and next-generation semiconductor devices where unusual metal-anion combinations may enable novel electronic behavior.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 25.50 | GPa | — | ||
Shear Modulus(G) | 11.88 | GPa | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.184 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -0.7190 | eV/atom | — |