O1 K4 Br2 is a halogenated semiconductor compound containing oxygen, potassium, and bromine. This is a research or specialized material rather than a commercially established semiconductor; compounds in this compositional family are investigated for potential applications in optoelectronics, photocatalysis, and solid-state ion conductivity due to their tunable band gaps and crystal structures. Engineers would consider this material primarily in experimental or next-generation device contexts where its unique electronic or ionic properties offer advantages over conventional semiconductors like silicon or gallium arsenide.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 19.34 | GPa | — | ||
Shear Modulus(G) | 10.79 | GPa | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.002 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.614 | eV/atom | — |