Ni₂Bi₂As₂O₁₀ is a complex mixed-metal oxide semiconductor belonging to the family of bismuth–nickel–arsenic compounds, synthesized primarily through solid-state or hydrothermal routes. This is a research-phase material studied for potential applications in photocatalysis, optoelectronics, and solid-state chemistry; it is not yet established in mainstream industrial production. The material is notable within its compound family for its layered or framework crystal structure, which can impart directional charge transport and photogenerated carrier separation—properties of interest to researchers exploring alternatives to conventional metal oxides for environmental remediation and energy conversion.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 1.136 | eV | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.213 | eV/atom | — |