Silicon oxynitride (Si₄O₂N₄) is an advanced ceramic compound combining silicon, oxygen, and nitrogen in a single-phase structure, typically produced through high-temperature synthesis or nitridation of silica precursors. This material is valued in demanding applications requiring exceptional hardness, thermal stability, and resistance to oxidation and chemical attack, making it particularly suitable for high-temperature structural components and wear-resistant applications where traditional silicates fall short. Silicon oxynitride offers advantages over pure silicon nitride in specific thermal and chemical environments, and represents an important member of the nonoxide ceramic family for extreme-service engineering.
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| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Bulk Modulus(K) | 123.3 | GPa | DFT · OptB88vdW | ||
Shear Modulus(G) | 98.57 | GPa | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 5.124 | eV | DFT · OptB88vdW |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | -1.722 | eV/atom | DFT · OptB88vdW |
Reference data from cited sources. Not verified or certified by MatWorld Inc. Verify against the source before use in design. Terms: engineering data