HfTaON2 is a hafnium–tantalum oxynitride ceramic compound, representing a refractory material class combining high-melting-point transition metals with nitrogen and oxygen bonding. This composition is primarily explored in advanced ceramics research for applications demanding extreme thermal stability and chemical resistance, particularly as a candidate material for next-generation thermal barrier coatings, refractory linings, and high-temperature structural components where conventional oxides or nitrides alone fall short.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | 0.000 | eV | — | ||
Magnetic Moment(μB) | 0.00815 | μB | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | 1.060 | eV/atom | — |