HfTaOFN

ceramic

· HfTaOFN

HfTaOFN is an advanced ceramic compound combining hafnium, tantalum, oxygen, and nitrogen—a refractory oxynitride in the high-entropy ceramic family. This material is primarily of research and developmental interest, explored for extreme-temperature applications where conventional ceramics face limitations; the hafnium-tantalum combination offers high melting points and chemical stability, while nitrogen incorporation can enhance hardness and thermal shock resistance compared to oxide-only alternatives.

hypersonic vehicle thermal protectionadvanced engine componentshigh-temperature coatingsrefractory applicationsaerospace research materials

Compliance & Regulations

?Conflict Free?RoHS?REACH?TSCA?Prop 65

Units:

si imperial

Property	Value	Unit	Conditions	Source
Band Gap(Eg)	0.000	eV	—
Magnetic Moment(μB)	1.775	μB	—

Verified Unverified Low confidence (<80%) Link to source

Property	Value	Unit	Conditions	Source
Formation Energy(ΔHf)	1.520	eV/atom	—

Verified Unverified Low confidence (<80%) Link to source

Regulatory Screening

Environmental

RoHS, REACH, and Prop 65 statuses are validated against official substance lists (ECHA SVHC Candidate List, OEHHA Prop 65, RoHS Annex II). Other regulations are estimated from composition and material classification. All screening is a starting point for due diligence — always verify with your supplier before making compliance decisions.

HfTaOFN

Electrical Properties

Other Properties

Regulatory Screening

Environmental