HfTaO2N
ceramicHfTaO2N is an oxynitride ceramic compound combining hafnium, tantalum, oxygen, and nitrogen—a research-phase material designed to combine the thermal stability and hardness of refractory oxides with the enhanced mechanical and chemical properties that nitrogen incorporation can provide. This material family is being investigated primarily for ultra-high-temperature structural applications and protective coatings where conventional oxides reach their thermal or oxidation limits. Notable for its potential in extreme-environment engineering, HfTaO2N represents the frontier of compositionally complex ceramics aimed at next-generation aerospace, power generation, and wear-resistant applications where cost and processing maturity are secondary to material performance at extreme conditions.
Compliance & Regulations
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Band Gap(Eg) | — | eV | — | — | |
Magnetic Moment(μB) | — | μB | — | — |
| Property | Value | Unit | Conditions | Source | |
|---|---|---|---|---|---|
Formation Energy(ΔHf) | — | eV/atom | — | — |